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SPIE Advanced Lithography to Draw Industry Leaders
January 8, 2009

The International Society for Optical Engineering (SPIE) Advanced Lithography, the foremost annual forum of the lithography community, will bring worldwide experts working in EUV, smart metrology, resist materials, processing technology, and other established and emerging topics to San Jose, CA, February 22nd-29th. The event, now in its 34th year, is expected to draw more than 4,000 attendees to the San Jose Convention Center and Marriott Hotel.

“For the past 33 years, SPIE Advanced Lithography has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry,” said Christopher J. Progler of Photronics Inc., the 2009 symposium chair. “If you can attend only one conference this year, SPIE Advanced Lithography is the obvious choice, as it brings the whole community to one place to solve today’s problems and plan for the future.”

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