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NEWS
SPIE Photomask Explores Deep Sub-Wavelength Era
October 2, 2008

The deep sub-wavelength era has arrived, and world leaders in the photomask industry will meet in Monterey, CA, to explore its challenges and opportunities. The International Society for Optical Engineering (SPIE) Photomask Technology symposium, sponsored annually by SPIE and BACUS, will provide a forum for reports on the latest research and emerging and on-going issues in advanced lithography, as well as manufacturing and data solutions. The event will be held October 6-10, 2008 at the Monterey Marriott and Monterey Conference Center. BACUS is SPIE’s international technical group for photomask technology.

In addition to technical presentations and a professional development program, the event includes an exhibition featuring the industry’s top manufacturers and designers. The exhibition is open to registrants for no additional fee.

Conference proceedings papers will be published online in the SPIE Digital Library beginning immediately as approved after the meeting. For more information about the SPIE Digital Library, visit spie.org/x2836.xml or access the library at spiedl.org.

Best paper and best poster awards will be announced during the conference banquet.

For more information about SPIE Photomask Technology, see spie.org/photomask.xml.


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